PVD processes |
Resistive-source deposition: Low-cost laminated and protected coatings for the visible (VIS) to near-infrared (N-IR) wavelength ranges. Products include dielectric interference filters, metallic induced-transmission filters, and metallic neutral-density filters.
Electron-beam (E-beam) deposition: Lower-cost laminated or exposed surface-coated filters that allow for full edge-to-edge coverage of the filter surface. Durability meets MIL-PRF-13830B Moderate. Products include dielectric interference filters, exposed surface-coated dichroic mirrors and beamsplitters, and anti-reflective (A/R) coatings.
E-beam ion-assisted deposition (IAD): E-beam deposition of reactive oxides for expanded capabilities in the ultraviolet (UV, 200 nm +) through N-IR wavelength ranges. Durability meets MIL-PRF-13830B Severe. Products include UV filters and coatings, exposed surface-coated metallic mirrors and beamsplitters, and exposed surface-coated metallic induced-transmission filters, as well as an expanded material selection for dichroic beamsplitters.
Modified Magnetron sputter deposition: Exposed surface-coated dielectric interference filters and beamsplitters having highest transmission (typically 93-97% T) and highest signal-to-noise (S/N) ratio, for the near-UV (200 nm +) through N-IR (2000 nm) . These products offer best durability and hardness.
